Interface characterization
Dear all,
We are all happy with the interface structures revealed by HREM. But is there any systematic way to clean the substrates before each deposition as it controls the interface microscopically. Let us start the discussion from the scratch! Please suggest right way of cleaning different substrates to avoid contaminants.
We are all happy with the interface structures revealed by HREM. But is there any systematic way to clean the substrates before each deposition as it controls the interface microscopically. Let us start the discussion from the scratch! Please suggest right way of cleaning different substrates to avoid contaminants.
Replies to This Discussion
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Permalink Reply by Wayne D. Kaplan on -
A good point, but I no longer believe in 'clean' surfaces or interfaces. The real question (after you clean it) is WHAT is there as a residue, and if you can't detect it, then what is the detection limit.
Too many works state that X was not detected, but there is no real meaning to this statement without stating what teh detection limit of the method used to measure X is!
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Permalink Reply by Dr. P. Kuppusami on -
I do agree with the statement. My point is if there is a difficulty in producing clean surfaces or interfaces then explaning certain growth aspects becomes meaningless. Therefore I raised the point on standardization of substrate cleaning as a starting point of the debate.
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